Central Facilities

The Center for Advanced Materials Research Microelectronics Central Facility is housed in approximately 1000 square feet of Class 1000 cleanroom with an additional Class 100 cleanroom for photolithography. The following systems and instruments are available in the facility:

• Lithography:
• Photoresist Spinner;
• Wet Chemistry Hoods;
• Karl Suss MJB-3 Mask Aligner*;
   
• Thin Film Deposition:
• Electron Beam Evaporator*;
• Thermal Evaporator;
• Three-target Magnetron Sputtering System;
• Plasmatherm*;
• LPCVD Tool;
• Oxford Instruments* Ion-beam Deposition Tool;
   
• Plasma Etching:
• Plasmatherm* (Fluorine-chemistry);
• Trion* (Chlorine-chemistry) RIE Tools;
   
• Furnaces:
• Wet Oxide and Dry Oxide;
• Dopant;
• LPCVD Si Deposition Furnaces for 2" Substrates;
• Inert Ambient Annealing Furnaces;
   
• Characterization:
• Dektak* Profilometer;
• Rudolph Ellipsometer;
• Cary Spectrophotometer;
   
• Other:
• Wire Bonder;
• Wet Chemistry Workbenches.

* major equipment

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Brown University, Providence RI 02912